ZHAO Hualong, ZHAO Binran, YAN Xiaoliang, et al. Ni/SiO2 catalyst for CO methanation with support treated by dielectric barrier discharge plasma[J]. CIESC Journal, 2013, (1): 283-288. DOI: 10.3969/j.issn.0438-1157.2013.01.031.
ZHAO Hualong, ZHAO Binran, YAN Xiaoliang, et al. Ni/SiO2 catalyst for CO methanation with support treated by dielectric barrier discharge plasma[J]. CIESC Journal, 2013, (1): 283-288. DOI: 10.3969/j.issn.0438-1157.2013.01.031.DOI:
Ni/SiO2 catalyst was prepared for CO methanation using SiO2 treated by dielectric barrier discharge plasma before impregnation.Compared with the conventional Ni/SiO2 catalyst without the treatment
the CO and H2 conversions at 400℃ were both approximately 6% higher for the support-treated catalyst.After the high temperature reaction at 700℃ for 6 h
the support-treated catalyst was still more active than conventional Ni/SiO2 catalyst.XRD
TEM and H2-TPR results showed that the support-treated catalyst had smaller Ni particle size and stronger interaction between Ni and SiO2
which confirmed that plasma treatment made SiO2 more favorable for Ni dispersion.