Kernel distance-based support vector data description (SVDD) for batch process monitoring exhibited poor monitoring precision by setting control limit from the largest kernel distance in historical process dataset but ignoring hyperspherical irregularity in high dimensional space. A kernel similarity based SVDD monitoring method was proposed for batch process monitoring. Kernel similarity was taken as kernel function value between support vectors and data samples for testing. The weighted summation of kernel similarity and distance of support vectors at various time points was utilized to set dynamic control limit for data samples of batch process to be monitored. Batch process monitoring was achieved by judging if kernel distance of test sample exceeded the dynamic control limit. This monitoring method considered irregularity of hypersphere

local distribution characteristics of process dataset in high dimensional space

and spontaneity of data samples

so that it could improve accuracy in batch process monitoring. Method effectiveness was demonstrated by numerical simulation and metal etching process in semiconductor manufacturing.