CHEN Jiayi, ZHAO Zhonggai, LIU Fei. Robust PPLS model and its applications in process monitoring[J]. CIESC Journal, 2016, (7): 2907-2915.DOI: 10.11949/j.issn.0438-1157.20151439.
A probability model can be developed by probabilistic partial least squares (PPLS) under the conditions that both principal components and errors satisfy Gaussian distribution. However
the expectation and variance of the Gaussian distribution is susceptible to outliers. As a result
the model is not robust for the real industrial process. This paper improves the robustness of the PPLS model based on the assumption that the raw data satisfy T distribution rather than Gaussian distribution. By adjusting the freedom degree of T distribution
the proposed robust probabilistic partial least squares (RPPLS) model can overcome the shortcomings of PPLS model. Furthermore
on the basis of RPPLS model
two monitoring indicators GT2 and GSPE are proposed to monitor the process state and the model changes
respectively. Comparing the monitoring performance in the TE process based on PPLS and RPPLS shows that RPPLS is more effective than PPLS in terms of the fault accuracy and the missing alarm rate.