Mechanism of removing arsenic and cadmium with ferric chloride

GUO Li; ZHAO Yanpeng; DU Dongyun

doi:10.3969/j.issn.0438-1157.2014.10.048

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Mechanism of removing arsenic and cadmium with ferric chloride

更新时间：2025-12-10

- Mechanism of removing arsenic and cadmium with ferric chloride
- CIESC Journal Issue 10, Pages: 4118-4122(2014)
- 作者机构：
  
  中南民族大学化学与材料科学学院, 催化材料科学国家民委-教育部共建重点实验室,湖北,武汉,430074
- 作者简介：
- 基金信息：
- DOI：10.3969/j.issn.0438-1157.2014.10.048
  CLC： 781
- Online First：05 October 2014，
  
  Published：05 October 2014
- 稿件说明：
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GUO Li, ZHAO Yanpeng, DU Dongyun. Mechanism of removing arsenic and cadmium with ferric chloride[J]. CIESC Journal, 2014, (10): 4118-4122.
DOI：

GUO Li, ZHAO Yanpeng, DU Dongyun. Mechanism of removing arsenic and cadmium with ferric chloride[J]. CIESC Journal, 2014, (10): 4118-4122. DOI： 10.3969/j.issn.0438-1157.2014.10.048.

摘要

采用电荷分布多位络合模型模拟（CD-MUSIC）、XPS、FTIR和Zeta电位分析的方法研究了三氯化铁去除As（Ⅴ）、Cd（Ⅱ）的机理。结果表明：在pH 3～7范围内，砷、镉通过竞争铁氧化物表面的有效作用位点而相互抑制；而在pH 7～10范围内，Cd（Ⅱ）主要以Cd（OH）2沉淀的方式得以去除，并通过共沉淀作用促进砷的去除。根据CD-MUSIC 模拟结果，As（Ⅴ）主要形成单齿单核质子化（FeOAsO3H1.5-、FeOAsO（H2O）20.5-）的表面配合物，结合常数分别为63.04、66.50；而 Cd（Ⅱ）则以 FeOHCd1.5+形态结合在铁氧化物的表面，结合常数为31.05，其含量随着pH的升高逐渐减少。

Abstract

The mechanism of arsenic and cadmium removal withferric chloride was studied by analysis of residue samples with CD-MUSIC

XPS

FTIR and Zeta potential. There was interference between As and Cd by competing the active site on iron oxide in the range of pH at 3-7. Nevertheless

in the range of pH at 7-10

Cd(Ⅱ) was mainly removed by precipitation as Cd(OH)2

which could increase As removal by co-precipitation. According to the results simulated with CD-MUSIC

As(Ⅴ) was mainly removed by forming monodentate uninuclear surface complexes ( FeOAsO3H1.5- and FeOAsO(H2O)20.5-)

with binding constants of 63.04 and 66.50 respectively. Besides

Cd(Ⅱ) was combined on the surface of ferriferrous oxide with the formation of FeOHCd1.5+ with binding constant of 31.05 and the amount of this complex decreased with rising pH.

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