Preparation and surface properties of fluorinated silanefunctional polybenzoxazine films

曲丽

doi:10.3969/j.issn.0438-1157.2012.06.041

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Preparation and surface properties of fluorinated silanefunctional polybenzoxazine films

更新时间：2025-12-10

- Preparation and surface properties of fluorinated silanefunctional polybenzoxazine films
- CIESC Journal Issue 6, Pages: 1934-1942(2012)
- 作者机构：
  
  华东理工大学化学工程联合国家重点实验室,上海
- 作者简介：
- 基金信息：
- DOI：10.3969/j.issn.0438-1157.2012.06.041
  CLC： 647
- Online First：05 June 2012，
  
  Published：05 June 2012
- 稿件说明：
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曲丽. Preparation and surface properties of fluorinated silanefunctional polybenzoxazine films[J]. CIESC Journal, 2012, (6): 1934-1942.
DOI：

曲丽. Preparation and surface properties of fluorinated silanefunctional polybenzoxazine films[J]. CIESC Journal, 2012, (6): 1934-1942. DOI： 10.3969/j.issn.0438-1157.2012.06.041.

摘要

本文合成了含氟硅氧烷苯并噁嗪单体，在采用光学显微镜等考察水解沉积条件对单体在羟基化基片表面化学成膜的影响的基础上，考察了温度、时间等对聚苯并噁嗪成膜后表面能的影响，并对聚苯并噁嗪材料在不同热处理温度（100℃-350℃）下表面能的热稳定性能进行了研究。结果表明用pH=2的盐酸溶液调节沉积液所得单体膜最均一完整，聚合物的表面能随着固化时间的增加先降低后升高，固化温度越高，达到完全固化所需要的固化时间越短，在160℃，190℃，220℃，240℃下固化所得聚合物最低表面能分别是15.6 mJ?m-2 (4 h)，15.0 mJ?m-2 (1 h)，15.3 mJ?m-2 (15 min)，15.5 mJ?m-2 (5 min)，均低于Teflon的表面能（22.0 mJ?m-2）。聚合物膜表面能在低于200℃的温度下处理其表面能可基本保持不变，可以作为抗粘材料应用于纳米压印技术中。

Abstract

Benzoxazine monomer with fluorinated silane-functional group was synthesized. The effect of hydrolytic immersion condition for the formation of films was tested. Furthermore

the effect of curing temperature and curing time on the surface free energy of the polybenzoxazines were investigated. The thermal stability of the polybenzoxazine at various thermal processing temperatuers （100℃-350℃）was also considered . The results indicate that the immersion solution modulated by hydrochloric acid solution (pH=2) displays the best film formation property. The lowest surface free energy of the polybenzoxazine cured at 160℃，190℃，220℃ and 240℃ are 15.6 mJ?m-2 (4 h)

15.0 mJ?m-2 (1 h)

15.3 mJ?m-2 (15 min)

15.5 mJ?m-2 (5 min) respectively

which are even lower than that of Teflon (22.0 mJ?m-2). The surface free energy of the polybenzoxazine possesses well themal stability below 200℃. The polybenzoxazine material is the most potential anti-adhesive materials applied in hot-embossing nanoimprint lithography.

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