Distribution of liquid film thickness and wave parameters in horizontal annular flow

Hongjun SUN; Wei WANG; Mingyang GUI

doi:10.11949/j.issn.0438-1157.20190388

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Distribution of liquid film thickness and wave parameters in horizontal annular flow

Fluid dynamics and transport phenomena | 更新时间：2020-06-24

- Distribution of liquid film thickness and wave parameters in horizontal annular flow
- CIESC Journal Vol. 70, Issue 11, Pages: 4162-4171(2019)
- 作者机构：
  
  1.Key Laboratory of Process Detection and Control, School of Electrical Automation and Information Engineering, Tianjin University, Tianjin 300072, China
  13.th Research Institute of China Electronics Technology Group Corporation, Shijiazhuang 050051, Hebei, China
- 作者简介：
- 基金信息：
- DOI：10.11949/j.issn.0438-1157.20190388
  CLC： O 359⁺.1
- Received：16 April 2019，
  
  Revised：2019-07-31，
  
  Published：05 November 2019
- 稿件说明：
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孙宏军, 王伟, 桂明洋. 水平管环状流液膜厚度与波动参数分布[J]. 化工学报, 2019, 70(11): 4162-4171

SUN Hongjun, WANG Wei, GUI Mingyang. Distribution of liquid film thickness and wave parameters in horizontal annular flow[J]. CIESC Journal, 2019, 70(11): 4162-4171
孙宏军, 王伟, 桂明洋. 水平管环状流液膜厚度与波动参数分布[J]. 化工学报, 2019, 70(11): 4162-4171 DOI： 10.11949/j.issn.0438-1157.20190388.

SUN Hongjun, WANG Wei, GUI Mingyang. Distribution of liquid film thickness and wave parameters in horizontal annular flow[J]. CIESC Journal, 2019, 70(11): 4162-4171 DOI： 10.11949/j.issn.0438-1157.20190388.

摘要

环状流是常见的一种气液两相流流型，基于双平行电导探针阵列传感器设计了环状流液膜动态测量系统，以水和空气为介质，进行了气相表观流速15~35 m/s、液相表观流速0.1~0.4 m/s范围内的水平管环状流周向液膜测量实验，分析了水平管环状流的液膜厚度、相界面波动参数的空间分布与发展变化规律。结果表明，水平管环状流底部液膜厚度随气相表观流速的增加而减小，随液相表观流速的增加而增大，但在高液相表观流速时有饱和趋势，对应条件下周向其他位置的液膜厚度持续增大，尤其在45°位置显著增大，下半周液膜分布趋于平缓；由底部到顶部，液膜波速和波频在周向上均呈逐渐减小趋势，与液膜厚度的分布规律一致，大幅度的扰动波主要分布在底部；底部液膜波速和波频随气相表观流速增加而增大，液相表观流速增加时，波速随之增大，但波频无明显变化，对应波长增大。

Abstract

Annular flow is a common type of gas-liquid two-phase flow. A dynamic measurement system for annular flow liquid film with double parallel conductance probes array sensor is designed. The experiments in horizontal annular flow with superficial gas velocity of 15－35 m/s and superficial liquid velocity of 0.1－0.4 m/s are carried out. And the distribution of liquid film thickness and phase interface wave parameters in horizontal annular flow is analyzed. The results show that the bottom liquid film thickness decreases with the increase of the superficial gas velocity

and increases with the increase of the superficial liquid velocity in the horizontal annular flow. But there is a saturated growth trend at high superficial liquid velocity. Meanwhile

the liquid film thickness at other circumferential positions increases continuously

especially at 45° position. And the distribution of liquid film tends to be uniform at the lower halve circumference. From the bottom to the top

the wave velocity and wave frequency of the circumferential liquid film decrease gradually

which is consistent with the distribution of the liquid film thickness. The large disturbance wave mainly distributes at the bottom. The wave velocity and wave frequency of the bottom liquid film increase with the increase of the superficial gas velocity. However

the influence of the superficial liquid velocity to wave velocity and wave frequency is different. With the increase of superficial liquid velocity

the wave velocity increases

but the wave frequency almost unchanged

and the wavelength increases correspondingly.

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references

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