Preparation and optical property study of plasmonic films with low infrared emissivity and low lightness

GUO Yueying; XIE Jianliang; PENG Bo

doi:10.11949/j.issn.0438-1157.20190063

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Preparation and optical property study of plasmonic films with low infrared emissivity and low lightness

Material science and engineering\, nanotechnology | 更新时间：2026-07-24

- Preparation and optical property study of plasmonic films with low infrared emissivity and low lightness
- CIESC Journal Vol. 70, Issue 6, Pages: 2325-2333(2019)
- 作者机构：
  
  电子科技大学电子科学与工程学院，四川成都 611730
- 作者简介：
- 基金信息：
- DOI：10.11949/j.issn.0438-1157.20190063
  CLC： TB 33
- Received：21 January 2019，
  
  Revised：2019-03-01，
  
  Online First：15 June 2020，
  
  Published：05 June 2019
- 稿件说明：
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郭月莹, 谢建良, 彭波. 可见高吸收红外高反射薄膜制备及光学特性研究[J]. 化工学报, 2019, 70(6): 2325-2333

GUO Yueying, XIE Jianliang, PENG Bo. Preparation and optical property study of plasmonic films with low infrared emissivity and low lightness[J]. CIESC Journal, 2019, 70(6): 2325-2333
郭月莹, 谢建良, 彭波. 可见高吸收红外高反射薄膜制备及光学特性研究[J]. 化工学报, 2019, 70(6): 2325-2333 DOI： 10.11949/j.issn.0438-1157.20190063.

GUO Yueying, XIE Jianliang, PENG Bo. Preparation and optical property study of plasmonic films with low infrared emissivity and low lightness[J]. CIESC Journal, 2019, 70(6): 2325-2333 DOI： 10.11949/j.issn.0438-1157.20190063.

摘要

设计一种同时满足可见光波段高吸收和远红外波段高反射的特殊结构是制备红外低发射涂层的重要挑战。利用溅射镀膜法和化学合成法制备得到不同尺寸的金纳米颗粒(AuNPs)，完成了AuNPs/SiO

/Al薄膜结构设计，并结合高级数值仿真软件对其结构进行理论分析，使用可见分光光度计和傅里叶红外光谱仪测试了其可见光和远红外波段反射谱，研究了等离激元模式在纳米复合结构薄膜中的应用。结果表明，金属纳米颗粒尺寸和介质层厚度对该薄膜的反射性能都有十分重要的影响，通过制备纳米复合材料，可见光波段吸收率达到64.07%，远红外波段反射率下降不超过2.29%。

Abstract

Designing a special structure that satisfies both the high absorption in the visible light band and the high reflection in the far infrared band is an important challenge in the preparation of infrared low emission coatings. The reflectance spectra of visible and far-infrared region were measured by UV-Vis spectrometer and Fourier transform infrared spectrometer. The results show that the size of the nanoparticles and the thickness of the dielectric layer influence the reflective performance of the film. The visible absorptivity is up to 64.07%

simultaneously the reflectance in the far-infrared region is not more than 2.29%.

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references

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