Modeling and Analysis of LPCVD Reactors

Zhu Kaihong; Chen Lianhen and Yuan Weikang(East China Institute of Chemical Technology; Shanghai)

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Modeling and Analysis of LPCVD Reactors

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- Modeling and Analysis of LPCVD Reactors
- CIESC Journal Issue 5, (1989)
- 作者机构：
  
  华东化工学院,华东化工学院,华东化工学院 ,上海,上海,上海
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Online First：25 October 1989，
  
  Published：25 October 1989
- 稿件说明：
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Zhu Kaihong, Chen Lianhen and Yuan Weikang(East China Institute of Chemical Technology, Shanghai). Modeling and Analysis of LPCVD Reactors[J]. CIESC Journal, 1989, (5).
DOI：

Zhu Kaihong, Chen Lianhen and Yuan Weikang(East China Institute of Chemical Technology, Shanghai). Modeling and Analysis of LPCVD Reactors[J]. CIESC Journal, 1989, (5). DOI：

摘要

本文利用低压化学蒸气淀积(LPCVD)反应器中衬底间隙内的扩散-反应过程和环形通道内的质量、热量传递过程的数学模型对片内和片间均匀性问题进行了分析。结果表明:片内均匀性h和片内效率因子n均可用体积变化准数和扩散准数的函数表示。合理设置管外加热装置

可改善片间均匀性或提高反应气流的转化率。这些结果可用于指导低压化学蒸气淀积反应器的设计和操作参数的选择

Abstract

In this paper the uniformity within and among the wafers in LPCVD reactors is analyzed by means of mathematical models

which describe the diffusion-reaction process between two adjacent wafers and mass

heat transport in the annular flow region. Results indicate that the uniformity h and effectiveness factorη within each wafer can be represented as function of volume change modulus ε and diffusion modulus φ; approprately installing heating device out of reactor tube can improve the uniformity from wafer to wafer or increase the conversion of reactant

These conclusions can serve as guidance tor design of LPCVD reactors and selection of operation parameters.

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