您当前的位置:
首页 >
文章列表页 >
XPS and AES Study on the Tarnishing Mechanism of Silver-Electroplated Deposit(Ⅱ) Mechanism of Tarnishing Caused by Exposure to Light and Na_2S Treatment
更新时间:2025-12-16
    • XPS and AES Study on the Tarnishing Mechanism of Silver-Electroplated Deposit(Ⅱ) Mechanism of Tarnishing Caused by Exposure to Light and Na_2S Treatment

    • CIESC Journal   Issue 2, (1985)
    • Online First:25 June 1985,

      Published:25 June 1985

    移动端阅览

  • Fang Jingli and Yu Yaohua(Coordination Chemistry Institute, Nanjing University). XPS and AES Study on the Tarnishing Mechanism of Silver-Electroplated Deposit(Ⅱ) Mechanism of Tarnishing Caused by Exposure to Light and Na_2S Treatment[J]. CIESC Journal, 1985, (2). DOI:

  •  
  •  
icon
试读结束,您可以激活您的VIP账号继续阅读。
去激活 >
icon
试读结束,您可以通过登录账户,到个人中心,购买VIP会员阅读全文。
已是VIP会员?
去登录 >

0

Views

213

下载量

0

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

Advantages and risks of swirling cooling granulation towers
Analysis of flow field characteristics and mixing performance of different SK-type static mixers
Performance analysis and application of thermal and humidity control system cascade driven by waste heat
Recent advances in machine learning for modeling and control of crystallization processes
Thermo-gas-elastic coupling performance analysis of high-speed and high-temperature foil face seals

Related Author

No data

Related Institution

No data
0