IV. INTERNAL SURFACE AVAILABLE IN THE INDUSTRIAL VANADIUM CONTACT MASS
|更新时间:2025-12-16
|
IV. INTERNAL SURFACE AVAILABLE IN THE INDUSTRIAL VANADIUM CONTACT MASS
CIESC JournalIssue 2, (1959)
作者机构:
中国科学院应用化学研究所,中国科学院应用化学研究所,中国科学院应用化学研究所
作者简介:
基金信息:
DOI:
CLC:
Online First:25 December 1959,
Published:25 December 1959
稿件说明:
移动端阅览
CHANG MAN-CHEN, Kuo SHEN-TU AND WANG SHIH-CHUN (Institute of Applied Chemistry, Academia Sinica). IV. INTERNAL SURFACE AVAILABLE IN THE INDUSTRIAL VANADIUM CONTACT MASS[J]. CIESC Journal, 1959, (2).
DOI:
CHANG MAN-CHEN, Kuo SHEN-TU AND WANG SHIH-CHUN (Institute of Applied Chemistry, Academia Sinica). IV. INTERNAL SURFACE AVAILABLE IN THE INDUSTRIAL VANADIUM CONTACT MASS[J]. CIESC Journal, 1959, (2).DOI:
IV. INTERNAL SURFACE AVAILABLE IN THE INDUSTRIAL VANADIUM CONTACT MASS
The fraction of the internal surface available for industrial vanadium catalysts in the oxidation of sulfur dioxide is rather small and becomes even smaller at higher conversions. Data from both laboratory experiments and industrial practice supported this view. The new fact on the surface available in the catalyst indicates that hollow-catalyst can be used in any part of the industrial converter and gives much higher efficiency.