ADSORPTION MODEL OF METAL ION   ON IMPRINTING CHITOSAN RESIN

谭天伟; 贺小进; 杜卫霞

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ADSORPTION MODEL OF METAL ION ON IMPRINTING CHITOSAN RESIN

更新时间：2025-12-10

- ADSORPTION MODEL OF METAL ION ON IMPRINTING CHITOSAN RESIN
- CIESC Journal Issue 2, (2001)
- 作者机构：
  
  北京化工大学生物化工系!北京100029,北京化工大学生物化工系!北京100029,北京化工大学生物化工系,北京,100029
- 作者简介：
- 基金信息：
- DOI：
  CLC： Q320
- Online First：25 February 2001，
  
  Published：25 February 2001
- 稿件说明：
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谭天伟, 贺小进, 杜卫霞. ADSORPTION MODEL OF METAL ION ON IMPRINTING CHITOSAN RESIN[J]. CIESC Journal, 2001, (2).
DOI：

谭天伟, 贺小进, 杜卫霞. ADSORPTION MODEL OF METAL ION ON IMPRINTING CHITOSAN RESIN[J]. CIESC Journal, 2001, (2). DOI：

摘要

Abstract

Adsorption model of metal ion on imprinting chitosan resin was studied. The chemical and the physical properties such as pore size distribution and heat stability were discussed and the imprinting chitosan resin can be used many times without losing adsorption capacity. The adsorption isotherms and adsorption mechanism were studied and a new model was suggested to correlate relation of adsorption with pH and metal ion concentration

which could explain mechanism of adsorption.

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