FABRICATION OF YTTRIA-STABILIZED ZIRCONIA(YSZ)FILM BY ELECTROCHEMICAL DEPOSITION
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FABRICATION OF YTTRIA-STABILIZED ZIRCONIA(YSZ)FILM BY ELECTROCHEMICAL DEPOSITION
CIESC JournalIssue 5, (2001)
作者机构:
中国科学院化工冶金研究所
作者简介:
基金信息:
DOI:
CLC:
Online First:25 May 2001,
Published:25 May 2001
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XIE Huiqin, DIAN Hongwei, KANG Xiaohong, et al. FABRICATION OF YTTRIA-STABILIZED ZIRCONIA(YSZ)FILM BY ELECTROCHEMICAL DEPOSITION[J]. CIESC Journal, 2001, (5).
DOI:
XIE Huiqin, DIAN Hongwei, KANG Xiaohong, et al. FABRICATION OF YTTRIA-STABILIZED ZIRCONIA(YSZ)FILM BY ELECTROCHEMICAL DEPOSITION[J]. CIESC Journal, 2001, (5).DOI:
FABRICATION OF YTTRIA-STABILIZED ZIRCONIA(YSZ)FILM BY ELECTROCHEMICAL DEPOSITION
摘要
Abstract
The yttria-stabilized zirconia(YSZ)film was fabricated on the La0.8Sr0.2MnO3(LSM)substrate by electrochemical deposition.The effects of electrochemical deposition conditions on morphological structure of Y(OH)3 -Zr(OH)4 film were studied.The optimal conditions for depositing homogeneous and compact hydroxide film were obtained.The experimental results show that the density of the electrophoretic deposition film is increased remarkably if electrochemical deposition is applied to fill in the pores.