PROCESS STUDY OF TiO_2 COATING ON A1_2O_3 PARTICLES BY CHEMICAL VAPOR DEPOSITION TECHNOLOGY

李春忠; 韩今依; 胡黎明; 华彬; 朱宏杰

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PROCESS STUDY OF TiO_2 COATING ON A1_2O_3 PARTICLES BY CHEMICAL VAPOR DEPOSITION TECHNOLOGY

更新时间：2025-12-16

- PROCESS STUDY OF TiO_2 COATING ON A1_2O_3 PARTICLES BY CHEMICAL VAPOR DEPOSITION TECHNOLOGY
- CIESC Journal Issue 2, (1995)
- 作者机构：
  
  华东理工大学技术化学物理研究所,华东理工大学技术化学物理研究所,华东理工大学技术化学物理研究所,华东理工大学技术化学物理研究所,华东理工大学技术化学物理研究所上海200237,上海200237,上海200237,上海200237,上海,200237
- 作者简介：
- 基金信息：
- DOI：
  CLC： Q133.1
- Online First：25 April 1995，
  
  Published：25 April 1995
- 稿件说明：
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李春忠, 韩今依, 胡黎明, et al. PROCESS STUDY OF TiO_2 COATING ON A1_2O_3 PARTICLES BY CHEMICAL VAPOR DEPOSITION TECHNOLOGY[J]. CIESC Journal, 1995, (2).
DOI：

李春忠, 韩今依, 胡黎明, et al. PROCESS STUDY OF TiO_2 COATING ON A1_2O_3 PARTICLES BY CHEMICAL VAPOR DEPOSITION TECHNOLOGY[J]. CIESC Journal, 1995, (2). DOI：

摘要

探讨了回转炉化学气相淀积（CVD）包覆新工艺

利用Ti（OC_4H_9）_4水解

在Al_2O_3粒子表面实现了TiO_2包覆

研究了包覆过程特征。结果表明

TiO_2在Al_2O_3粒子表面的包覆是成功的

并具有一定的致密性

包覆量为0.1%～10%;化学气相包覆过程中既存在成膜包覆

又存在成核包覆

通过控制反应物浓度等方法可以强化成膜包覆

提高包覆效果。

Abstract

The process of Chemical Vapor Deposition (CVD) coating was investigated in the rotating reactor. Base on this

TiO2 was coated on A12O3 particles by using hydrolysis reaction of Ti(OC4H9)4

and the mechanism of the coating process was studied. The results indicated that : (1) The coating film of TiO2 on A12O3 was compactness and uniform

and the coating quantity of TiO2 was about 0. 1%-10%; (2) The coated TiO2 was amorophous at low reaction temperature and was anatase at reaction temperature higher than 673K

the amorophous TiO2 could be translated to anatase by high temperature heat treatment; (3) Nucleation and film formation co - existed in the coating process

and nucleation could be promoted by controlling the concentration of reactant.

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