CONTROLLING OF PARTICLE FORMATION AND FILM GROWTH IN THE CVD REACTOR

李春忠; 胡黎明; 袁渭康; 陈敏恒

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CONTROLLING OF PARTICLE FORMATION AND FILM GROWTH IN THE CVD REACTOR

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- CONTROLLING OF PARTICLE FORMATION AND FILM GROWTH IN THE CVD REACTOR
- CIESC Journal Issue 5, (1993)
- 作者机构：
  
  华东化工学院技术化学物理研究所,华东化工学院技术化学物理研究所,华东化工学院技术化学物理研究所,华东化工学院技术化学物理研究所上海200237,上海200237,上海200237,上海,200237
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Online First：25 October 1993，
  
  Published：25 October 1993
- 稿件说明：
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李春忠, 胡黎明, 袁渭康, et al. CONTROLLING OF PARTICLE FORMATION AND FILM GROWTH IN THE CVD REACTOR[J]. CIESC Journal, 1993, (5).
DOI：

李春忠, 胡黎明, 袁渭康, et al. CONTROLLING OF PARTICLE FORMATION AND FILM GROWTH IN THE CVD REACTOR[J]. CIESC Journal, 1993, (5). DOI：

摘要

基于气溶胶动力学和化学反应动力学

建立了化学气相淀积(CVD)反应器中普适动力学方程

导出了CVD反应器中超细颗粒粒径分布谱函数和薄膜淀积速率的计算方法;研究了操作参数对钛酸丁酯高温裂解过程中成核与成膜的影响.用成核与成膜竞争判据——H准数

研究了CVD反应器中成核与成膜的控制策略.

Abstract

A generalzed dynamic equation based on aerosol dynamics and reaction kinetics for a CVD reactor was derived

and a calculation method for particle size distribution and film growth rate in the CVD reactor was developed. The effects of operation parameters on particle formation and film growth process were simulated with this method. By means of a dimensionless parameter H

the optimal condition for particle formation and film growth in the CVD reactor could be determined quantatively.

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