Ding Ping and Yuan Weikang(East China Institute of Chemical Technology, Shanghai 200237). NUMERICAL ANALYSIS OF CHEMICAL VAPOR DEPOSITION REACTORS ( I ) ANALYSIS OF CVD OF TiN COATING IN A COLD-WALL REACTOR[J]. CIESC Journal, 1992, (4).
DOI:
Ding Ping and Yuan Weikang(East China Institute of Chemical Technology, Shanghai 200237). NUMERICAL ANALYSIS OF CHEMICAL VAPOR DEPOSITION REACTORS ( I ) ANALYSIS OF CVD OF TiN COATING IN A COLD-WALL REACTOR[J]. CIESC Journal, 1992, (4).DOI:
NUMERICAL ANALYSIS OF CHEMICAL VAPOR DEPOSITION REACTORS ( I ) ANALYSIS OF CVD OF TiN COATING IN A COLD-WALL REACTOR
heat transfer and mass transfer are incorporated in a two-dimensional model of an axisymmetric reactor. The problem is solved numerically by Galerkin finite element method
using a velocity-pressure formulation for the N-S equations. The dependence of density
viscosity
thermal conductivity and diffusion coefficient on temperature are considered and the presence of free convection is simulated rather well. The distributions of velocity
temperature
TiCl4 concentration in the reactor and the deposition rate of TiN on the substrate are predicted. The computational results are in good agreement with experimental data.