Electrochemical behavior of m-NO2 C6 H4 SO3 Na onCu electrode in different media

TU Xiaohua; CHU Youqun; ZHAO Fengming; HUANG Xiangyue; MA Chun’an

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Electrochemical behavior of m-NO₂ C₆ H₄SO₃ Na onCu electrode in different media

更新时间：2025-12-10

- Electrochemical behavior of m-NO₂ C₆ H₄SO₃ Na onCu electrode in different media
- CIESC Journal Issue S1, Pages: 15-19(2008)
- 作者机构：
  
  1. 浙江工业大学应用化学系
  2. 绿色化学合成技术国家重点实验室培育基地
- 作者简介：
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- Online First：30 June 2008，
  
  Published：30 June 2008
- 稿件说明：
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TU Xiaohua, CHU Youqun, ZHAO Fengming, et al. Electrochemical behavior of m-NO₂ C₆ H₄SO₃ Na onCu electrode in different media[J]. CIESC Journal, 2008, (S1): 15-19.
DOI：

TU Xiaohua, CHU Youqun, ZHAO Fengming, et al. Electrochemical behavior of m-NO₂ C₆ H₄SO₃ Na onCu electrode in different media[J]. CIESC Journal, 2008, (S1): 15-19. DOI：

摘要

研究了铜电极上间硝基苯磺酸钠在含有四丁基高氯酸铵（TBAP）电解质的质子惰性介质（DMF）、质子介质（H2O）及混合介质（DMF/H2O）中的电化学行为。结果表明：在质子惰性介质中，间硝基苯磺酸钠分步连续地被还原为ArNO-2·和［ArNO2］2-·阴离子自由基;其中ArNO2/ArNO-2·为扩散控制的单电子转移可逆氧化还原反应。在水溶液中，间硝基苯磺酸钠经历了ArNO2/ArNO和ArNO/ArNHOH反应。而在混合溶剂中，由于DMF的存在阻碍了硝基的质子化进程，间硝基苯磺酸钠经历了ArNO2/ArNO-2·和ArNO-2·/ArNHOH反应。通过量化计算进一步证实了上述实验结果。

Abstract

The electrochemical behavior of m-NO2C6 H4SO3 Na on Cu electrode is investigated in DMF（TBAP），H2O and DMF/H2O（TBAP） mediaThe working electrode was a Cu electrode，the auxiliary electrode was a large area platinum wire，and the reference electrode was a saturated calomel electrodeIt was shown that the reaction of m-NO2C6H4SO3Na on Cu electrode would undergo two steps in which ArNO2/ArNO-2·was a reversible process controlled by the diffusion of m-NO2C6H4 SO3 Na in aprotic mediumIn protic medium，the electrochemical reduction of m-NO2C6H4SO3Na would undergo two steps of oxidation-reduction reaction of ArNO2/ArNO and ArNO/ArNHOHWhile in mixed medium，due to the hindrance of protonation by DMF，m-NO2C6H4SO3Na was firstly reduced to ArNO-2· and further reduced to ArNHOHThese results could be interpreted by the calculation of qauntum

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