MECHANISM OF FILM FORMING FOR IMIDAZOLE AND ITS DERIVATIVES ON SURFACE OF COPPER
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MECHANISM OF FILM FORMING FOR IMIDAZOLE AND ITS DERIVATIVES ON SURFACE OF COPPER
CIESC JournalIssue 4, Pages: 659-663(2004)
作者机构:
北京化工大学材料科学与工程学院,北京,100029
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Online First:25 April 2004,
Published:25 April 2004
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ZHAO Yongsheng, PANG Zhengzhi, LU Yanhua. MECHANISM OF FILM FORMING FOR IMIDAZOLE AND ITS DERIVATIVES ON SURFACE OF COPPER[J]. CIESC Journal, 2004, (4): 659-663.
DOI:
ZHAO Yongsheng, PANG Zhengzhi, LU Yanhua. MECHANISM OF FILM FORMING FOR IMIDAZOLE AND ITS DERIVATIVES ON SURFACE OF COPPER[J]. CIESC Journal, 2004, (4): 659-663.DOI:
MECHANISM OF FILM FORMING FOR IMIDAZOLE AND ITS DERIVATIVES ON SURFACE OF COPPER
The UV absorbances of Cu (Ⅱ) analog complexes prepared with imidazole and several derivatives were determined
on the basis of which the structures of the analog complexes and the coordination agent-coordination center ratios of the complexes were obtained. The structures of the films formed by imidazole compounds on the surface of copper were determined by using XPS.The mechanism of film forming for imidazole and its derivatives on the surface of copper was developed by means of comparing the structures of the films and those of the analog complexes.